SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
气相色谱法测定薄膜中氢含量
吕惠云; 陈克铭
1993
Source Publication半导体学报
Volume14Issue:3Pages:189
metadata_83中科院半导体所
Subject Area半导体化学
Indexed ByCSCD
Language中文
CSCD IDCSCD:199013
Date Available2010-11-23
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Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20135
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
吕惠云,陈克铭. 气相色谱法测定薄膜中氢含量[J]. 半导体学报,1993,14(3):189.
APA 吕惠云,&陈克铭.(1993).气相色谱法测定薄膜中氢含量.半导体学报,14(3),189.
MLA 吕惠云,et al."气相色谱法测定薄膜中氢含量".半导体学报 14.3(1993):189.
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