SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Co-Si多层膜在稳态热退火中的固相界面反应
顾诠; 陈维德; 许振嘉
1993
Source Publication半导体学报
Volume14Issue:10Pages:612
metadata_83中科院半导体所
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language中文
CSCD IDCSCD:199089
Date Available2010-11-23
Citation statistics
Cited Times:1[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20093
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
顾诠,陈维德,许振嘉. Co-Si多层膜在稳态热退火中的固相界面反应[J]. 半导体学报,1993,14(10):612.
APA 顾诠,陈维德,&许振嘉.(1993).Co-Si多层膜在稳态热退火中的固相界面反应.半导体学报,14(10),612.
MLA 顾诠,et al."Co-Si多层膜在稳态热退火中的固相界面反应".半导体学报 14.10(1993):612.
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