Co-Si多层膜在稳态热退火中的固相界面反应

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	Co-Si多层膜在稳态热退火中的固相界面反应
	顾诠; 陈维德; 许振嘉
	1993
Source Publication	半导体学报
Volume	14 Issue:10 Pages:612
metadata_83	中科院半导体所
Subject Area	半导体材料
Funding Organization	国家自然科学基金
Indexed By	CSCD
Language	中文
CSCD ID	CSCD:199089
Date Available	2010-11-23
Citation statistics	Cited Times:1[CSCD] [CSCD Record]
Document Type	期刊论文
Identifier	http://ir.semi.ac.cn/handle/172111/20093
Collection	中国科学院半导体研究所（2009年前）
Recommended Citation GB/T 7714	顾诠,陈维德,许振嘉. Co-Si多层膜在稳态热退火中的固相界面反应[J]. 半导体学报,1993,14(10):612.
APA	顾诠,陈维德,&许振嘉.(1993).Co-Si多层膜在稳态热退火中的固相界面反应.半导体学报,14(10),612.
MLA	顾诠,et al."Co-Si多层膜在稳态热退火中的固相界面反应".半导体学报 14.10(1993):612.

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