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Co-Si多层膜在稳态热退火中的固相界面反应 | |
顾诠; 陈维德; 许振嘉 | |
1993 | |
Source Publication | 半导体学报
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Volume | 14Issue:10Pages:612 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体材料 |
Funding Organization | 国家自然科学基金 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:199089 |
Date Available | 2010-11-23 |
Citation statistics |
Cited Times:1[CSCD]
[CSCD Record]
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Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/20093 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 顾诠,陈维德,许振嘉. Co-Si多层膜在稳态热退火中的固相界面反应[J]. 半导体学报,1993,14(10):612. |
APA | 顾诠,陈维德,&许振嘉.(1993).Co-Si多层膜在稳态热退火中的固相界面反应.半导体学报,14(10),612. |
MLA | 顾诠,et al."Co-Si多层膜在稳态热退火中的固相界面反应".半导体学报 14.10(1993):612. |
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6153.pdf(166KB) | 限制开放 | -- | Application Full Text |
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