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氯对硅中4d过渡杂质的钝化 | |
周洁; 王永康; 孙景兰; 卢励吾; 吴汲安 | |
1994 | |
Source Publication | 电子学报
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Volume | 22Issue:5Pages:80 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体化学 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:234195 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/19957 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 周洁,王永康,孙景兰,等. 氯对硅中4d过渡杂质的钝化[J]. 电子学报,1994,22(5):80. |
APA | 周洁,王永康,孙景兰,卢励吾,&吴汲安.(1994).氯对硅中4d过渡杂质的钝化.电子学报,22(5),80. |
MLA | 周洁,et al."氯对硅中4d过渡杂质的钝化".电子学报 22.5(1994):80. |
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6080.pdf(107KB) | 限制开放 | -- | Application Full Text |
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