氯对硅中4d过渡杂质的钝化

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	氯对硅中4d过渡杂质的钝化
	周洁; 王永康; 孙景兰; 卢励吾; 吴汲安
	1994
Source Publication	电子学报
Volume	22 Issue:5 Pages:80
metadata_83	中科院半导体所
Subject Area	半导体化学
Indexed By	CSCD
Language	中文
CSCD ID	CSCD:234195
Date Available	2010-11-23
Citation statistics
Document Type	期刊论文
Identifier	http://ir.semi.ac.cn/handle/172111/19957
Collection	中国科学院半导体研究所（2009年前）
Recommended Citation GB/T 7714	周洁,王永康,孙景兰,等. 氯对硅中4d过渡杂质的钝化[J]. 电子学报,1994,22(5):80.
APA	周洁,王永康,孙景兰,卢励吾,&吴汲安.(1994).氯对硅中4d过渡杂质的钝化.电子学报,22(5),80.
MLA	周洁,et al."氯对硅中4d过渡杂质的钝化".电子学报 22.5(1994):80.

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