SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
氯对硅中4d过渡杂质的钝化
周洁; 王永康; 孙景兰; 卢励吾; 吴汲安
1994
Source Publication电子学报
Volume22Issue:5Pages:80
metadata_83中科院半导体所
Subject Area半导体化学
Indexed ByCSCD
Language中文
CSCD IDCSCD:234195
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/19957
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
周洁,王永康,孙景兰,等. 氯对硅中4d过渡杂质的钝化[J]. 电子学报,1994,22(5):80.
APA 周洁,王永康,孙景兰,卢励吾,&吴汲安.(1994).氯对硅中4d过渡杂质的钝化.电子学报,22(5),80.
MLA 周洁,et al."氯对硅中4d过渡杂质的钝化".电子学报 22.5(1994):80.
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