SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
W/Si,WSi2/Si和W/TiN纳米多层膜的成膜特性和热稳定性
刘文汉; 周凌云; 伍历文; 张裕恒; 许振嘉
1994
Source Publication科学通报
Volume39Issue:7Pages:594
metadata_83中国科学技术大学基础物理中心;中国科学技术大学;中科院半导体所
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language中文
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/19923
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
刘文汉,周凌云,伍历文,等. W/Si,WSi2/Si和W/TiN纳米多层膜的成膜特性和热稳定性[J]. 科学通报,1994,39(7):594.
APA 刘文汉,周凌云,伍历文,张裕恒,&许振嘉.(1994).W/Si,WSi2/Si和W/TiN纳米多层膜的成膜特性和热稳定性.科学通报,39(7),594.
MLA 刘文汉,et al."W/Si,WSi2/Si和W/TiN纳米多层膜的成膜特性和热稳定性".科学通报 39.7(1994):594.
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