SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
半导体材料与器体生产工艺尾气中砷、磷、硫的治理及检测
闻瑞梅; 梁骏吾; 邓礼生; 彭永清
1995
Source Publication半导体学报
Volume16Issue:3Pages:188
Abstract研究了化合物半导体材料、器件生产工艺中排出的有毒物质砷、磷、硫及其化合物的治理方法。还研究了这些有毒物质的低温富集取样及快速、灵敏的分析监测方法,并与其它经典的方法作了对比。
metadata_83中科院半导体所
Subject Area半导体化学
Indexed ByCSCD
Language中文
CSCD IDCSCD:262051
Date Available2010-11-23
Citation statistics
Cited Times:3[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/19839
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
闻瑞梅,梁骏吾,邓礼生,等. 半导体材料与器体生产工艺尾气中砷、磷、硫的治理及检测[J]. 半导体学报,1995,16(3):188.
APA 闻瑞梅,梁骏吾,邓礼生,&彭永清.(1995).半导体材料与器体生产工艺尾气中砷、磷、硫的治理及检测.半导体学报,16(3),188.
MLA 闻瑞梅,et al."半导体材料与器体生产工艺尾气中砷、磷、硫的治理及检测".半导体学报 16.3(1995):188.
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