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用气相色谱法测定半导体工艺中固、液、气相砷、磷及化合物的新方法
闻瑞梅
1997
Source Publication半导体学报
Volume18Issue:1Pages:64
Abstract研究了一种快速、灵敏、可靠的高温氢还原-气相色谱分析方法,样品不需预处理,使气相色谱仪能直接测定固、液、气相样品中砷、磷及其化合物的含量.砷、磷的检测限分别为0.01mg/L和0.003mg/L.相对偏差分别为6.2%和8.6%,测定范围为10~(-5)~10~(-11),并与经典方法进行对比,结果一致.
metadata_83中科院半导体所
Subject Area半导体化学
Indexed ByCSCD
Language中文
CSCD IDCSCD:358653
Date Available2010-11-23
Citation statistics
Cited Times:1[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/19417
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
闻瑞梅. 用气相色谱法测定半导体工艺中固、液、气相砷、磷及化合物的新方法[J]. 半导体学报,1997,18(1):64.
APA 闻瑞梅.(1997).用气相色谱法测定半导体工艺中固、液、气相砷、磷及化合物的新方法.半导体学报,18(1),64.
MLA 闻瑞梅."用气相色谱法测定半导体工艺中固、液、气相砷、磷及化合物的新方法".半导体学报 18.1(1997):64.
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