Knowledge Management System Of Institute of Semiconductors,CAS
GaAs晶片化学机械抛光的机理分析 | |
卜俊鹏; 郑红军; 何宏家; 吴让元 | |
1997 | |
Source Publication | 固体电子学研究与进展
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Volume | 17Issue:4Pages:399 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体材料 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:371557 |
Date Available | 2010-11-23 |
Citation statistics |
Cited Times:4[CSCD]
[CSCD Record]
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Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/19375 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 卜俊鹏,郑红军,何宏家,等. GaAs晶片化学机械抛光的机理分析[J]. 固体电子学研究与进展,1997,17(4):399. |
APA | 卜俊鹏,郑红军,何宏家,&吴让元.(1997).GaAs晶片化学机械抛光的机理分析.固体电子学研究与进展,17(4),399. |
MLA | 卜俊鹏,et al."GaAs晶片化学机械抛光的机理分析".固体电子学研究与进展 17.4(1997):399. |
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5776.pdf(207KB) | 限制开放 | -- | Application Full Text |
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