Knowledge Management System Of Institute of Semiconductors,CAS
CoSi2超薄外延膜的生长研究 | |
姚振钰; 张国炳; 秦复光; 刘志凯; 张建辉; 林兰英 | |
1998 | |
Source Publication | 半导体学报
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Volume | 19Issue:3Pages:221 |
metadata_83 | 中科院半导体所;北京大学微电子所 |
Subject Area | 半导体材料 |
Funding Organization | 国家八五计划 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:423637 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/19227 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 姚振钰,张国炳,秦复光,等. CoSi2超薄外延膜的生长研究[J]. 半导体学报,1998,19(3):221. |
APA | 姚振钰,张国炳,秦复光,刘志凯,张建辉,&林兰英.(1998).CoSi2超薄外延膜的生长研究.半导体学报,19(3),221. |
MLA | 姚振钰,et al."CoSi2超薄外延膜的生长研究".半导体学报 19.3(1998):221. |
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