SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Ni?莫来石界面反应的XPS研究
陈新; 王佑祥; 谢侃; 陈春华; 刘振祥; 刘志平; 高尚通
1996
Source Publication清华大学学报. 自然科学版
Volume36Issue:增刊Pages:75
metadata_83中科院半导体所;中科院物理所;电子部第13所
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language中文
CSCD IDCSCD:520984
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/19015
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
陈新,王佑祥,谢侃,等. Ni?莫来石界面反应的XPS研究[J]. 清华大学学报. 自然科学版,1996,36(增刊):75.
APA 陈新.,王佑祥.,谢侃.,陈春华.,刘振祥.,...&高尚通.(1996).Ni?莫来石界面反应的XPS研究.清华大学学报. 自然科学版,36(增刊),75.
MLA 陈新,et al."Ni?莫来石界面反应的XPS研究".清华大学学报. 自然科学版 36.增刊(1996):75.
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