Knowledge Management System Of Institute of Semiconductors,CAS
Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays | |
Wang XH(王杏华); Song AM(宋爱民); Cheng WC(程文超); Li GH(李国华); Li CF(李承芳); Li YX(李月霞); Tan PH(谭平恒)![]() | |
2000 | |
Source Publication | 半导体学报
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Volume | 21Issue:1Pages:22 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体化学 |
Indexed By | CSCD |
Language | 英语 |
CSCD ID | CSCD:532646 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/18843 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | Wang XH,Song AM,Cheng WC,et al. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报,2000,21(1):22. |
APA | 王杏华.,宋爱民.,程文超.,李国华.,李承芳.,...&谭平恒.(2000).Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays.半导体学报,21(1),22. |
MLA | 王杏华,et al."Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays".半导体学报 21.1(2000):22. |
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5469.pdf(326KB) | 限制开放 | -- | Application Full Text |
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