Application of  Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot   Arrays

SEMI OpenIR > 中国科学院半导体研究所（2009年前）

	Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays
	Wang XH(王杏华); Song AM(宋爱民); Cheng WC(程文超); Li GH(李国华); Li CF(李承芳); Li YX(李月霞); Tan PH(谭平恒)
	2000
Source Publication	半导体学报
Volume	21 Issue:1 Pages:22
metadata_83	中科院半导体所
Subject Area	半导体化学
Indexed By	CSCD
Language	英语
CSCD ID	CSCD:532646
Date Available	2010-11-23
Citation statistics
Document Type	期刊论文
Identifier	http://ir.semi.ac.cn/handle/172111/18843
Collection	中国科学院半导体研究所（2009年前）
Recommended Citation GB/T 7714	Wang XH,Song AM,Cheng WC,et al. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报,2000,21(1):22.
APA	王杏华.,宋爱民.,程文超.,李国华.,李承芳.,...&谭平恒.(2000).Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays.半导体学报,21(1),22.
MLA	王杏华,et al."Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays".半导体学报 21.1(2000):22.

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