SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays
Wang XH(王杏华); Song AM(宋爱民); Cheng WC(程文超); Li GH(李国华); Li CF(李承芳); Li YX(李月霞); Tan PH(谭平恒)
2000
Source Publication半导体学报
Volume21Issue:1Pages:22
metadata_83中科院半导体所
Subject Area半导体化学
Indexed ByCSCD
Language英语
CSCD IDCSCD:532646
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18843
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
Wang XH,Song AM,Cheng WC,et al. Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays[J]. 半导体学报,2000,21(1):22.
APA 王杏华.,宋爱民.,程文超.,李国华.,李承芳.,...&谭平恒.(2000).Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays.半导体学报,21(1),22.
MLA 王杏华,et al."Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays".半导体学报 21.1(2000):22.
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