SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
硅单晶生长中氩气流动对氧碳含量的影响
任丙彦; 张志成; 刘彩池; 郝秋燕; 王猛
2001
Source Publication半导体学报
Volume22Issue:11Pages:1416
metadata_83河北工业大学半导体材料研究所;中科院半导体所
Subject Area光电子学
Funding Organization河北省科技攻关项目,国家自然科学基金
Indexed ByCSCD
Language中文
CSCD IDCSCD:533149
Date Available2010-11-23
Citation statistics
Cited Times:1[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18621
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
任丙彦,张志成,刘彩池,等. 硅单晶生长中氩气流动对氧碳含量的影响[J]. 半导体学报,2001,22(11):1416.
APA 任丙彦,张志成,刘彩池,郝秋燕,&王猛.(2001).硅单晶生长中氩气流动对氧碳含量的影响.半导体学报,22(11),1416.
MLA 任丙彦,et al."硅单晶生长中氩气流动对氧碳含量的影响".半导体学报 22.11(2001):1416.
Files in This Item:
File Name/Size DocType Version Access License
5358.pdf(223KB) 限制开放--Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[任丙彦]'s Articles
[张志成]'s Articles
[刘彩池]'s Articles
Baidu academic
Similar articles in Baidu academic
[任丙彦]'s Articles
[张志成]'s Articles
[刘彩池]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[任丙彦]'s Articles
[张志成]'s Articles
[刘彩池]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.