SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
电子级多晶硅的生产工艺
梁骏吾
2000
Source Publication中国工程科学
Volume2Issue:12Pages:34
metadata_83中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
CSCD IDCSCD:594273
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18511
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
梁骏吾. 电子级多晶硅的生产工艺[J]. 中国工程科学,2000,2(12):34.
APA 梁骏吾.(2000).电子级多晶硅的生产工艺.中国工程科学,2(12),34.
MLA 梁骏吾."电子级多晶硅的生产工艺".中国工程科学 2.12(2000):34.
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