SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
ECR Plasma CVD淀积光电器件介质膜的工艺模拟
谭满清; 陆建祖; 李玉鉴
2000
Source Publication功能材料与器件学报
Volume6Issue:3Pages:248
metadata_83中科院半导体所工程中心
Subject Area半导体器件
Funding Organization国家863计划
Indexed ByCSCD
Language中文
CSCD IDCSCD:608028
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18449
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
谭满清,陆建祖,李玉鉴. ECR Plasma CVD淀积光电器件介质膜的工艺模拟[J]. 功能材料与器件学报,2000,6(3):248.
APA 谭满清,陆建祖,&李玉鉴.(2000).ECR Plasma CVD淀积光电器件介质膜的工艺模拟.功能材料与器件学报,6(3),248.
MLA 谭满清,et al."ECR Plasma CVD淀积光电器件介质膜的工艺模拟".功能材料与器件学报 6.3(2000):248.
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