SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
用PECVD在低温衬底上制备类金刚石碳膜(英文)
廖显伯; 邓勋明
2000
Source Publication人工晶体学报
Volume29Issue:3Pages:220
Abstract报道用RF PECVD在低温衬底上制备了类金刚石碳(DLC)膜。研究了氢稀释、气体压力和RF功率对薄膜性质的影响。用光透射率、红外吸收谱和小角度X射线衍射谱分析了DLC膜的结构和光学性质。
metadata_83Toledo大学物理天文系;中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
CSCD IDCSCD:726575
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18285
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
廖显伯,邓勋明. 用PECVD在低温衬底上制备类金刚石碳膜(英文)[J]. 人工晶体学报,2000,29(3):220.
APA 廖显伯,&邓勋明.(2000).用PECVD在低温衬底上制备类金刚石碳膜(英文).人工晶体学报,29(3),220.
MLA 廖显伯,et al."用PECVD在低温衬底上制备类金刚石碳膜(英文)".人工晶体学报 29.3(2000):220.
Files in This Item:
File Name/Size DocType Version Access License
5190.pdf(278KB) 限制开放--Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[廖显伯]'s Articles
[邓勋明]'s Articles
Baidu academic
Similar articles in Baidu academic
[廖显伯]'s Articles
[邓勋明]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[廖显伯]'s Articles
[邓勋明]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.