SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
气相和溶液多硫化物钝化InP表面的XPS和AFM研究
陈维德; 蔡永康; 苏景隆; 郭伟民
1999
Source Publication真空科学与技术学报
Volume19Issue:3Pages:21
metadata_83中科院半导体所;香港中文大学化学系
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language中文
CSCD IDCSCD:904765
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/18179
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
陈维德,蔡永康,苏景隆,等. 气相和溶液多硫化物钝化InP表面的XPS和AFM研究[J]. 真空科学与技术学报,1999,19(3):21.
APA 陈维德,蔡永康,苏景隆,&郭伟民.(1999).气相和溶液多硫化物钝化InP表面的XPS和AFM研究.真空科学与技术学报,19(3),21.
MLA 陈维德,et al."气相和溶液多硫化物钝化InP表面的XPS和AFM研究".真空科学与技术学报 19.3(1999):21.
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