SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
双异质外延Si/Al_2O_3/Si薄膜制作的CMOS器件
昝育德; 王俊; 李瑞云; 韩秀峰; 王建华; 于芳; 刘忠立; 王玉田; 王占国; 林兰英
2004
Source Publication半导体学报
Volume25Issue:7Pages:824-830
Abstract报道了利用高真空MOCVD外延生长γ氧化铝的技术和利用SOS CMOS的成熟工艺制作双异质外延Si/γ-Al2O3/Si单晶薄膜以及用其研制Si/γ-Al2O3/Si CMOS场效应晶体管、Si/γ-Al2O3/Si CMOS集成电路的初步结果.
metadata_83中国科学院半导体研究所
Subject Area微电子学
Indexed ByCSCD
Language中文
CSCD IDCSCD:1691367
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/17383
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
昝育德,王俊,李瑞云,等. 双异质外延Si/Al_2O_3/Si薄膜制作的CMOS器件[J]. 半导体学报,2004,25(7):824-830.
APA 昝育德.,王俊.,李瑞云.,韩秀峰.,王建华.,...&林兰英.(2004).双异质外延Si/Al_2O_3/Si薄膜制作的CMOS器件.半导体学报,25(7),824-830.
MLA 昝育德,et al."双异质外延Si/Al_2O_3/Si薄膜制作的CMOS器件".半导体学报 25.7(2004):824-830.
Files in This Item:
File Name/Size DocType Version Access License
4708.pdf(410KB) 限制开放--Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[昝育德]'s Articles
[王俊]'s Articles
[李瑞云]'s Articles
Baidu academic
Similar articles in Baidu academic
[昝育德]'s Articles
[王俊]'s Articles
[李瑞云]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[昝育德]'s Articles
[王俊]'s Articles
[李瑞云]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.