SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
氧离子束辅助激光淀积生长ZnO/Si的研究
李庚伟; 吴正龙; 邵素珍; 张建辉; 刘志凯
2005
Source Publication材料导报
Volume19Issue:2Pages:109-111
Abstract利用X射线衍射(XRD),X射线摇摆曲线(XRC)和X射线光电子能谱(XPS)分析方法对氧离子束辅助激光淀积生长的ZnO/Si异质结薄膜进行了分析.结果表明:用该法可生长出高度c轴单一取向ZnO薄膜,XRC的半高宽度(FWHM)仅为2.918°.表明此生长方法经优化,可生长出单晶质量很好的ZnO/Si薄膜.
metadata_83(北京)中国地质大学材料科学与工程学院;北京师范大学分析测试中心;北京市第四十七中学;中科院半导体所
Subject Area半导体材料
Funding Organization国家"863"计划资助项目
Indexed ByCSCD
Language中文
CSCD IDCSCD:1920132
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/17153
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
李庚伟,吴正龙,邵素珍,等. 氧离子束辅助激光淀积生长ZnO/Si的研究[J]. 材料导报,2005,19(2):109-111.
APA 李庚伟,吴正龙,邵素珍,张建辉,&刘志凯.(2005).氧离子束辅助激光淀积生长ZnO/Si的研究.材料导报,19(2),109-111.
MLA 李庚伟,et al."氧离子束辅助激光淀积生长ZnO/Si的研究".材料导报 19.2(2005):109-111.
Files in This Item:
File Name/Size DocType Version Access License
4566.pdf(267KB) 限制开放--Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[李庚伟]'s Articles
[吴正龙]'s Articles
[邵素珍]'s Articles
Baidu academic
Similar articles in Baidu academic
[李庚伟]'s Articles
[吴正龙]'s Articles
[邵素珍]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[李庚伟]'s Articles
[吴正龙]'s Articles
[邵素珍]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.