Knowledge Management System Of Institute of Semiconductors,CAS
| Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip | |
Xie Hongyun; Zhou Fan; Wang Baojun; Yang Hua ; Zhu Hongliang; Zhao Lingjuan; Wang Wei
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| 2005 | |
| Source Publication | 半导体学报
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| Volume | 26Issue:7Pages:1287-1290 |
| Abstract | A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure |
| metadata_83 | institute of semiconductors, chinese academy of sciences |
| Subject Area | 半导体材料 |
| Funding Organization | 国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目 |
| Indexed By | CSCD |
| Language | 英语 |
| CSCD ID | CSCD:2091961 |
| Date Available | 2010-11-23 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/16955 |
| Collection | 中国科学院半导体研究所（2009年前） |
| Recommended Citation GB/T 7714 | Xie Hongyun,Zhou Fan,Wang Baojun,et al. Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip[J]. 半导体学报,2005,26(7):1287-1290. |
| APA | Xie Hongyun.,Zhou Fan.,Wang Baojun.,Yang Hua.,Zhu Hongliang.,...&Wang Wei.(2005).Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip.半导体学报,26(7),1287-1290. |
| MLA | Xie Hongyun,et al."Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip".半导体学报 26.7(2005):1287-1290. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 4456.pdf（317KB） | 限制开放 | -- | Application Full Text | |||
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