SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Fabrication of a Silicon-Based Microprobe for Neural Interface Applications
Sui Xiaohong; Zhang Ruoxin; Pei Weihua; Lu Lin; Chen Hongda
2006
Source Publication半导体学报
Volume27Issue:10Pages:1703-1706
AbstractA two-dimensional (2D) multi-channel silicon-based microelectrode array is developed for recording neural signals. Three photolithographic masks are utilized in the fabrication process. SEM images show that the microprobe is 1. 2mm long,100μm wide,and 30μm thick, with recording sites spaced 200μm apart for good signal isolation. For the individual recording sites, the characteristics of impedance versus frequency are shown by in vitro testing. The impedance declines from 14MΩ to 1.9kv as the frequency changes from 0 to 10MHz. A compatible PCB (print circuit board) aids in the less troublesome implantation and stabilization of the microprobe.
metadata_83institute of semiconductors, chinese academy of sciences
Subject Area光电子学
Funding OrganizationNational High Technology Research,Development Program of China,National Natural Science Foundation of China
Indexed ByCSCD
Language英语
CSCD IDCSCD:2429665
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/16611
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
Sui Xiaohong,Zhang Ruoxin,Pei Weihua,et al. Fabrication of a Silicon-Based Microprobe for Neural Interface Applications[J]. 半导体学报,2006,27(10):1703-1706.
APA Sui Xiaohong,Zhang Ruoxin,Pei Weihua,Lu Lin,&Chen Hongda.(2006).Fabrication of a Silicon-Based Microprobe for Neural Interface Applications.半导体学报,27(10),1703-1706.
MLA Sui Xiaohong,et al."Fabrication of a Silicon-Based Microprobe for Neural Interface Applications".半导体学报 27.10(2006):1703-1706.
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