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An All-E-Beam Lithography Process for the Patterning of 2D Photonic Crystal Waveguide Devices | |
Yu Hejun; Yu Jinzhong; Chen Shaowu![]() | |
2006 | |
Source Publication | 半导体学报
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Volume | 27Issue:11Pages:1894-1899 |
Abstract | We present an all-e-beam lithography (EBL) process for the patterning of photonic crystal waveguides.The whole device structures are exposed in two steps. Holes constituting the photonic crystal lattice and defects are first exposed with a small exposure step size (less than 10nm). With the introduction of the additional proximity effect to compensate the original proximity effect, the shape, size, and position of the holes can be well controlled.The second step is the exposure of the access waveguides at a larger step size (about 30nm) to improve the scan speed of the EBL. The influence of write-field stitching error can be alleviated by replacing the original waveguides with tapered waveguides at the joint of adjacent write-fields. It is found experimentally that a higher exposure efficiency is achieved with a larger step size;however,a larger step size requires a higher dose. |
metadata_83 | institute of semiconductors, chinese academy of sciences |
Subject Area | 光电子学 |
Funding Organization | National Natural Science Foundation of China |
Indexed By | CSCD |
Language | 英语 |
CSCD ID | CSCD:2615817 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/16485 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | Yu Hejun,Yu Jinzhong,Chen Shaowu. An All-E-Beam Lithography Process for the Patterning of 2D Photonic Crystal Waveguide Devices[J]. 半导体学报,2006,27(11):1894-1899. |
APA | Yu Hejun,Yu Jinzhong,&Chen Shaowu.(2006).An All-E-Beam Lithography Process for the Patterning of 2D Photonic Crystal Waveguide Devices.半导体学报,27(11),1894-1899. |
MLA | Yu Hejun,et al."An All-E-Beam Lithography Process for the Patterning of 2D Photonic Crystal Waveguide Devices".半导体学报 27.11(2006):1894-1899. |
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