Low-frequency noise properties of GaN Schottky barriers deposited on intermediate temperature buffer layers
Leung BH; Fong WK; Surya C; Lu LW; Ge WK; Surya C Hong Kong Polytech Univ Photon Res Ctr Dept Elect & Informat Engn Hong Kong Hong Kong Peoples R China. 电子邮箱地址: ensurya@polyu.edu.hk
2003
会议名称1st International Symposium on Point Defect and Stoichiometry
会议录名称MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 6 (5-6)
页码523-525
会议日期MAR 20-22, 2003
会议地点Sendai, JAPAN
出版地THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND
出版者ELSEVIER SCI LTD
ISSN1369-8001
部门归属hong kong polytech univ, photon res ctr, dept elect & informat engn, hong kong, hong kong, peoples r china; chinese acad sci, inst semicond, lab semicond mat sci, beijing 100083, peoples r china; hong kong univ sci & technol, dept phys, hong kong, hong kong, peoples r china
摘要Metal-semiconductor-metal (MSM) structures were fabricated by RF-plasma-assisted MBE using different buffer layer structures. One type of buffer structure consists of an AlN high-temperature buffer layer (HTBL) and a GaN intermediate temperature buffer layer (ITBL), another buffer structure consists of just a single A IN HTBL. Systematic measurements in the flicker noise and deep level transient Fourier spectroscopy (DLTFS) measurements were used to characterize the defect properties in the films. Both the noise and DLTFS measurements indicate improved properties for devices fabricated with the use of ITBL and is attributed to the relaxation of residue strain in the epitaxial layer during growth process. (C) 2003 Elsevier Ltd. All rights reserved.
关键词Gan Low-frequency Noise Deep Levels Deep Level Transient Fourier Spectroscopy Devices
学科领域半导体物理
收录类别CPCI-S
语种英语
文献类型会议论文
条目标识符http://ir.semi.ac.cn/handle/172111/13601
专题中国科学院半导体研究所(2009年前)
通讯作者Surya C Hong Kong Polytech Univ Photon Res Ctr Dept Elect & Informat Engn Hong Kong Hong Kong Peoples R China. 电子邮箱地址: ensurya@polyu.edu.hk
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Leung BH,Fong WK,Surya C,et al. Low-frequency noise properties of GaN Schottky barriers deposited on intermediate temperature buffer layers[C]. THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, OXON, ENGLAND:ELSEVIER SCI LTD,2003:523-525.
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