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题名: Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams
作者: Liao MY;  Qin FG;  Chai CL;  Liu ZK;  Yang SY;  Yao ZY;  Wang ZG
发表日期: 2001
摘要: Carbon films were deposited by mass-selected ion beam technique with ion energies 50-200eV at a substrate temperature from room temperature to 80 degreesC,. For the energies used, smooth diamond-like carbon films were deposited at room temperature. When the substrate temperature was 600 degreesC,rough graphitic films were produced. But highly oriented carbon tubes were observed when the energies were larger than 140eV at 800 degreesC. They were perpendicular to the surface and parallel to each other. preferred orientation of graphite basic plane was observed by high-resolution electron microscopy. Shallow ion implantation and stress are responsible for this orientation.
KOS主题词: Surface contamination;  Atomic force microscopy;  Carbon;  Silicon;  Development;  Example;  Modeling
刊名: ACTA PHYSICA SINICA
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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Liao MY; Qin FG; Chai CL; Liu ZK; Yang SY; Yao ZY; Wang ZG .Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams ,ACTA PHYSICA SINICA,2001 ,50(7):1324-1328
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