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题名: The structure and current-voltage characteristics of multi-sheet InGaN quantum dots grown by a new multi-step method
作者: Chen Z;  Lu DC;  Han P;  Liu XL;  Wang XH;  Li YF;  Yuan HR;  Lu Y;  Bing LD;  Zhu QS;  Wang ZG;  Wang XF;  Yan L
发表日期: 2002
摘要: Multi-sheet InGaN/GaN quantum dots (QDs) were grown successfully by surface passivation processing and low-temperature growth in metalorganic chemical vapor deposition. This method based on the principle of increasing the energy barrier of adatom hopping by surface passivation and low-temperature growth, is quite different from present methods. The InGaN quantum dots in the first layer of about 40-nm-wide and 15-nm-high grown by this method were revealed by atomic force microscopy. The InGaN QDs in upper layer grew bigger. To our knowledge, the current-voltage characteristics of multi-sheet InGaN/GaN QDs were measured for the fist time. Two kinds of resonance-tunneling-current features were observed which were attributed to the low-dimensional localization effect. Some current peaks only appeared in positive voltage for sample due to the non-uniformity of the QDs in the structure. (C) 2002 Elsevier Science B.V. All rights reserved.
KOS主题词: Nanostructured materials;  Metal organic chemical vapor deposition;  Nitrides;  Epitaxy;  Gallium arsenide;  Photoluminescence;  Surfactant;  aluminum gallium arsenides;  Wire
刊名: JOURNAL OF CRYSTAL GROWTH
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Chen Z; Lu DC; Han P; Liu XL; Wang XH; Li YF; Yuan HR; Lu Y; Bing LD; Zhu QS; Wang ZG; Wang XF; Yan L .The structure and current-voltage characteristics of multi-sheet InGaN quantum dots grown by a new multi-step method ,JOURNAL OF CRYSTAL GROWTH,2002,243 (1):19-24
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