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题名: Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy
作者: Luo XD;  Xu ZY;  Wang YQ;  Wang WX;  Wang JN;  Ge WK
发表日期: 2003
摘要: The growth interruption (GI) effect on GaSb quantum dot formation grown on GaAs by molecular beam epitaxy was investigated. The structure characterization was performed by reflection high-energy electron diffraction (RHEED), along with photoluminescence measurements. It is found that the GI can significantly change the surface morphology of GaSb QDs. During the GI, the QDs structures can be smoothed out and turned into a 2D-like structure. The time duration of the GI required for the 3D/2D transition depends on the growth time of the GaSb layer. It increases with the increase of the growth time. Our results are explained by a combined effect of the stress relaxation process and surface exchange reactions during the GI. (C) 2002 Elsevier Science B.V. All rights reserved.
KOS主题词: atomic layer deposition;  Quantum dots;  Wells
刊名: JOURNAL OF CRYSTAL GROWTH
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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Luo XD; Xu ZY; Wang YQ; Wang WX; Wang JN; Ge WK .Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy ,JOURNAL OF CRYSTAL GROWTH,2003,247 (1-2):99-104
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