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题名: Influence of heated catalyzer on thermal distribution of substrate in HWCVD system
作者: Zhang Q;  Zhu M;  Wang L;  Liu E
发表日期: 2003
摘要: Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved.
KOS主题词: Digital computer simulation;  amorphous silicon;  sedimentation
刊名: THIN SOLID FILMS
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Zhang Q; Zhu M; Wang L; Liu E .Influence of heated catalyzer on thermal distribution of substrate in HWCVD system ,THIN SOLID FILMS,2003,430 (1-2):50-53
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