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题名: Amorphous silicon nanoparticles in compound films grown on cold substrates for high-efficiency photoluminescence
作者: Wang YQ;  Chen WD;  Liao XB;  Cao ZX
发表日期: 2003
摘要: Silicon nanoparticles have been fabricated in both oxide and nitride matrices by using plasma-enhanced chemical vapour deposition, for which a low substrate temperature down to 50 degreesC turns out to be most favourable. High-rate deposition onto such a cold substrate results in the formation of nanoscaled silicon particles, which have revealed an amorphous nature under transmission electron microscope (TEM) examination. The particle size can be readily controlled below 3.0 nm, and the number density amounts to over 10(12) cm(-2), as calculated from the TEM micrographs. Strong photoluminescence in the whole visible light range has been observed in the as-deposited Si-in-SiOx and Si-in-SiNx thin films. Without altering the size or structure of the particles, a post-annealing at 300 degreesC for 2 min raised the photoluminescence efficiency to a level comparable to the achievements with nanocrystalline Si-in-SiO2 samples prepared at high temperature. This low-temperature procedure for fabricating light-emitting silicon structures opens up the possibility of manufacturing integrated silicon-based optoelectronics.
KOS主题词: Luminescence
刊名: NANOTECHNOLOGY
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Wang YQ; Chen WD; Liao XB; Cao ZX .Amorphous silicon nanoparticles in compound films grown on cold substrates for high-efficiency photoluminescence ,NANOTECHNOLOGY,2003 ,14 (11):1235-1238
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