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题名: Optical properties of semiconductor quantum-well material using photonic crystal fabricated by micro-fabrication machine
作者: Xu XS;  Xiong ZG;  Sun ZH;  Du W;  Lu L;  Chen HD;  Jin AZ;  Zhang DZ
发表日期: 2006
摘要: Two-dimensional photonic crystals in near infrared region were fabricated by using the focused ion beam ( FIB) method and the method of electron-beam lithography (EBL) combined with dry etching. Both methods can fabricate perfect crystals, the method of FIB is simple,the other is more complicated. It is shown that the material with the photonic crystal fabricated by FIB has no fluorescence,on the other hand, the small-lattice photonic crystal made by EBL combined with dry etching can enhance the extraction efficiency two folds, though the photonic crystal has some disorder. The mechanisms of the enhanced-emission and the absence of emission are also discussed.
KOS主题词: Lithography, Electron beam
刊名: ACTA PHYSICA SINICA
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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推荐引用方式:
Xu XS; Xiong ZG; Sun ZH; Du W; Lu L; Chen HD; Jin AZ; Zhang DZ .Optical properties of semiconductor quantum-well material using photonic crystal fabricated by micro-fabrication machine ,ACTA PHYSICA SINICA,2006,55(3):1248-1252
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