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题名: Shrinkage of nanocavities in silicon during electron beam irradiation
作者: Zhu XF (Zhu Xianfang)
发表日期: 2006
摘要: An internal shrinkage of nanocavity in silicon was in situ observed under irradiation of energetic electron on electron transmission microscopy. Because there is no addition of any external materials to cavity site, a predicted nanosize effect on the shrinkage was observed. At the same time, because there is no ion cascade effect as encountered in the previous ion irradiation-induced nanocavity shrinkage experiment, the electron irradiation-induced instability of nanocavity also provides a further more convincing evidence to demonstrate the predicted irradiation-induced athermal activation effect. (c) 2006 American Institute of Physics.
KOS主题词: ion irradiation;  In situ;  VACANCIES
刊名: JOURNAL OF APPLIED PHYSICS
专题: 中国科学院半导体研究所(2009年前)_期刊论文

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Zhu XF (Zhu Xianfang) .Shrinkage of nanocavities in silicon during electron beam irradiation ,JOURNAL OF APPLIED PHYSICS,2006 ,100(3):Art.No.034304
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