A fair use statement regarding the full text of the request

Your requested [ECR Plasma CVD淀积光电器件介质膜的工艺模拟] is currently limited to Institute of Semiconductors,Chinese Academy of Sciences internal sharing.

To solicit author authorization, you need to provide the following information: name, organization, personal e-mail, reason for request. The information you provide will be reviewed and you are committed to the truth of the information provided. The personal information you provide will be protected according to law.

ECR Plasma CVD淀积光电器件介质膜的工艺模拟

You agree and are willing to abide by the above requirements.