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A fair use statement regarding the full text of the request

Your requested [脉冲激光退火制备Ni/SiC欧姆接触] is currently limited to Institute of Semiconductors,Chinese Academy of Sciences internal sharing.


To solicit author authorization, you need to provide the following information: name, organization, personal e-mail, reason for request. The information you provide will be reviewed and you are committed to the truth of the information provided. The personal information you provide will be protected according to law.

脉冲激光退火制备Ni/SiC欧姆接触
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You agree and are willing to abide by the above requirements.